Our Products
- Other Machinery (4)
- Grinding Wheels (1)
- Diamond, CBN Tools and Cutters (1)
- Other Machinery (1)
Contact Information
Room B2,, 10F, No.189, Sec.1, Yongfu Rd., West Central District, Tainan City, Taiwan, ROC
Tel: 886-6-2137155
Fax: 886-6-2137667
Sputtering Target Material
Model: TBA
Category: Machinery Parts and Components / Other Machinery / Other Machinery
Characteristics
靶材
磁控濺射鍍膜是一種新型的物理氣相鍍膜方式,就是用電子槍系統把電子發射並聚焦在被鍍的材料上，使其被濺射出來的原子遵循動量轉換原理以較高的動能脫離材料飛向基片澱積成膜。這種被鍍的材料就叫濺射靶材。
金太客提供高纯度靶材
Cr target 鉻靶材 Ti target 鈦靶材
Si target 矽靶材(硅靶材) Nb target 鈮靶材
NiCr target 鎳鉻合金靶材 Ta target 鉭靶材
Si+Cu target 矽銅組合靶材(硅銅組合靶材)
多弧鉻矽靶(硅靶)
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